Maskless Surface morphing by Holographic Hyper Lithography

Introduction

Photonics, the science of harnessing light, has the potential to revolutionize many sectors of society. The envisioned transition from electronics to photonic technologies requires advanced and miniaturized optical devices.

Challenges in Fabrication

Planar optical components, realized as micro- and nanoscale structured surfaces, are at the forefront of this transition. However, their fabrication by traditional methods is still a barrier to their widespread use in applications. A photolithographic process that fully exploits the multiple degrees of freedom of light is part of the solution.

HyperMaSH Concept

HyperMaSH will introduce a radically new concept for surface photopatterning of advanced planar optical components: the Vector-Time-Color Hyper Lithography. I will define a multi-dimensional space of lithographic parameters, where the following aspects are simultaneously and synergically engineered:

1. Intensity pattern
2. Polarization distribution
3. Time evolution
4. Wavelength of a holographic light field

Methodology

For HyperMaSH’s approach, I will leverage the peculiar vectorial and reversible photoresponse of azobenzene-containing materials in combination with Jones matrix holography and digital holographic microscopy. The result will be the dynamical and reversible manipulation of the surface morphology on a micro and nano spatial scale.

Direct Production of Components

Operating diffractive optical components and metasurfaces will be directly produced without any of the post-exposure processes of standard photolithography.

Environmental Impact and Implications

I will realize a paradigm shift by developing an unprecedented direct and high-resolution patterning method with significantly reduced environmental impact and energy consumption.

Broader Impact

Results will have far-reaching implications beyond the fabrication of planar optical components to be used either directly or as reusable masters for surface templating. HyperMaSH envisions a general lithographic method for functional surfaces and contributes to the understanding of the complex light-matter interactions occurring in azomaterials.