Transparent conductive oxide nanocrYstalline films for eleCtronics and optoelectronics via low-cost solution prOcessing

Introduction

The TCOtronics project aims at developing and bridging to the market a revolutionary concept of a low-cost solution process to fabricate transparent conductive oxide-based films optimized for optical, electronic, and optoelectronic applications.

Project Goals

We will fabricate multilayer photonic structures for filters and mirrors, as well as transparent electrodes for visible solar cells and transparent electronic circuits. The project will employ only Earth-abundant elements and will scale up the fabrication process by developing and optimizing nanocrystal inks for printers.

Importance of Transparent Conducting Films

Transparent conducting films (TCFs) are very important for many different applications, including:

• Touch screens
• Portable and flexible electronics
• Optics
• Multifunctional windows
• Solar cells

The TCF market is anticipated to reach USD 10.2 billion by 2028, with a CAGR growth of 9.8% in terms of value from 2020 to 2028.

Market Dynamics

The TCF market has been dominated by transparent conducting oxide (TCOs) thin films for many decades. TCOs carefully balance electrical conductivity controlled by doping with other elements and optical transmittance. However, the ceramic nature of TCO films makes them often brittle and fragile. Additionally, their deposition conditions are not compatible with the printing of electronic components on flexible substrates.

Challenges and Opportunities

This brittleness ultimately affects the flexible and portable electronics sector, indicating that alternative fabrication protocols are desired. Furthermore, the optical properties of thin film oxides are crucial, particularly in the near and mid-infrared wavelength range, which is becoming increasingly important for:

1. Wireless communication
2. Biophotonics
3. Sensing
4. Heat shielding

Conclusion

Hence, novel, more cost-effective processing techniques are required to replace the current deposition methods of oxides in general and TCOs in particular. These new techniques should result in similar optical and electrical quality as the industrially well-established deposition techniques currently used for transparent electrodes and photonic structures.